Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

Coatings, MDPI

Dallaev, R; Sobola, D; Tofel, P; Skvarenina, L; Sedlak, P, 2020: Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum. COATINGS, MDPI 10(10), p. 954-1 - 954-14, doi: 10.3390/coatings10100954
(ICON-SPM, KRATOS-XPS, SIMS)

Equipment:

• Scanning Probe Microscope Bruker Dimension Icon
• X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra
• Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5

Research Groups:

• Advanced Instrumentation and Methods for Materials Characterization - Jozef Kaiser
• CF: CEITEC Nano

CEITEC authors:

• Dinara Sobola, Ph.D.
• Pavel Tofel, Ph.D.