The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning
APPLIED SURFACE SCIENCE
GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263; FULL TEXT
(ICON-SPM, KERR-MICROSCOPE, LYRA, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS)
Equipment:
- Scanning Probe Microscope Bruker Dimension Icon
- Magneto-optical Kerr microscope
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
- Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS
- Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150
Research Groups:
- Nanomagnetism and spintronics - Vojtěch Uhlíř
- CF: CEITEC Nano
- Fabrication and Characterisation of Nanostructures - Tomáš Šikola
CEITEC authors: