Characterization of graphene elecrical properties on MEMS structures

Bachelor´s thesis

Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
(MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)

Equipment:

• 4-probe station Cascade Microtech MPS 150
• Witec Alpha 300R
• Electron beam evaporator BESTEC
• Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
• Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
• UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
• Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
• RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
• RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100
• Resist stripper Diener electronic NANO Plasma cleaner
• Ion beam etching Scia Systems Coat 200

Research Groups:

• CF: CEITEC Nano
• Smart Nanodevices - Vojtěch Adam

CEITEC authors:

• Jan Brodský