An ultra-low energy (30–200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum

MACH, J.; ŠAMOŘIL, T.; VOBORNÝ, S.; KOLÍBAL, M.; ZLÁMAL, J.; SPOUSTA, J.; DITTRICHOVÁ, L.; ŠIKOLA, T., 2011: An ultra-low energy (30–200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum. , p. 083302-1 - 7; FULL TEXT

Research Groups:

• Fabrication and Characterisation of Nanostructures - Tomáš Šikola

CEITEC authors:

• Jindřich Mach, Ph.D.
• Tomáš Šamořil, Ph.D.
• Stanislav Voborný, Ph.D.
• Miroslav Kolíbal, Ph.D.
• Jakub Zlámal, Ph.D.
• Prof. Jiří Spousta, Ph.D.
• Libuše Dittrichová
• Prof. Tomáš Šikola