Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering

Applied Surface Science

Mascaretti, L.; Barman, T.; Bricchi, B. R.; Münz, F.; Li Bassi, A.; Kment, Š.; Naldoni, A., 2021: Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering. APPLIED SURFACE SCIENCE 554, doi: 10.1016/j.apsusc.2021.149543; FULL TEXT
(WOOLLAM-VIS)

Equipment:

• NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE

Research Groups:

• CF: CEITEC Nano

CEITEC authors:

• Filip Münz, Ph.D.