RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80 (RIE-FLUORINE)

Detailed description:

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.
A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber. Gas enters through small inlets in the top of the chamber and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process; for instance, sulfur hexafluoride is commonly used for etching silicon. Gas pressure is typically maintained in a range between a few millitorrs and a few hundred millitorrs by adjusting gas flow rates and/or adjusting an exhaust orifice.

Publications:

• Sepúlveda, M.; Kamnev, K.; Pytlicek, Z.; Prasek, J.; Mozalev, A., 2021: Superhydrophobic–Oleophobic Visible–Transparent Antireflective Nanostructured Anodic HfO2 Multifunctional Coatings for Potential Solar Panel Applications. ACS APPLIED NANO MATERIALS 4(2), p. 1754 - 1765, doi: 10.1021/acsanm.0c03202; FULL TEXT
  (MAGNETRON, RIE-FLUORINE, VERIOS, JAZ3-CHANNEL)
• Takhsha Ghahfarokhi, M.; Arregi, J. A.; Casoli, F.; Horký, M.; Cabassi, R.; Uhlíř, V.; Albertini, F., 2021: Microfabricated ferromagnetic-shape-memory Heuslers: The geometry and size effects. APPLIED MATERIALS TODAY 23, doi: 10.1016/j.apmt.2021.101058; FULL TEXT
  (VERSALAB, RIGAKU9, KERR-MICROSCOPE, SUSS-MA8, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, VERIOS)
• Zadorozhnii, O., 2021: Exchange bias in metamagnetic heterostructures. MASTER´S THESIS , p. 1 - 81; FULL TEXT
  (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, LYRA, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS)
• LEDNICKÝ, T.; BONYÁR, A., 2020: Large Scale Fabrication of Ordered Gold Nanoparticle-Epoxy Surface Nanocomposites and Their Application as Label-Free Plasmonic DNA Biosensors. ACS APPL MATER INTER 12(4), p. 4804 - 11, doi: 10.1021/acsami.9b20907; FULL TEXT
  (MAGNETRON, RIE-FLUORINE, VERIOS, LYRA, HELIOS, KRATOS-XPS)
• Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
  (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)

• Hache, T.; Vanatka, M.; Flajsman, L.; Weinhold, T.; Hula, T.; Ciubotariu, O.; Albrecht, M.; Arkook, B.; Barsukov, I.; Fallarino, L.; Hellwig, O.; Fassbender, J.; Urbanek, M.; Schultheiss, H., 2020: Freestanding Positionable Microwave-Antenna Device for Magneto-Optical Spectroscopy Experiments. PHYSICAL REVIEW APPLIED 13(5), p. 054009-1 - 10, doi: 10.1103/PhysRevApplied.13.054009; FULL TEXT
  (RAITH, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, BRILLOUIN)
• Rovenská, K., 2020: Dielectric metasurfaces as modern optical components. MASTER´S THESIS , p. 1 - 57
  (MAGNETRON, DEKTAK, KRATOS-XPS, MIRA, EVAPORATOR, VERIOS, RIE-FLUORINE, ALD)
• LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
  (SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE, XEF2, APCVD, LYRA)
• LIŠKA, J.; LIGMAJER, F.; PINHO NASCIMENTO, P.; KEJÍK, L.; KVAPIL, M.; DVOŘÁK, P.; HORKÝ, M.; LEITNER, N.; REIMHULT, E.; ŠIKOLA, T., 2020: Effect of deposition angle on fabrication of plasmonic gold nanocones and nanodiscs. MICROELECTRONIC ENGINEERING 228, p. 1 - 6, doi: 10.1016/j.mee.2020.111326; FULL TEXT
  (EVAPORATOR, LYRA, RIE-FLUORINE, MIRA, ICON-SPM)
• Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
  (MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
• Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
  (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM, PARYLENE, XEF2)
• Hegrová, V., 2019: Application of correlative AFM/SEM microscopy. MASTER´S THESIS , p. 1 - 64
  (LYRA, LITESCOPE, MIRA, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER)
• Hajduček, J., 2019: Substrate-controlled nucleation of the magnetic phase transtition in nanostructures. BACHELOR´S THESIS , p. 1 - 46
  (MAGNETRON, ICON-SPM, CRYOGENIC, MIRA, RIE-FLUORINE, EVAPORATOR, VERSALAB)
• CHMELA, O.; SADÍLEK, J.; SAMA, DOMENECH-GIL, G.; J.; SOMER, J.; MOHAN, R.; ROMANO-RODRIGUEZ, A.; HUBÁLEK, J.; VALLEJOS VARGAS, S., 2018: Selectively arranged single-wire based nanosensor array systems for gas monitoring. NANOSCALE 10(19), p. 9087 - 10, doi: 10.1039/c8nr01588k; FULL TEXT
  (RAITH, DWL, KAUFMAN, MAGNETRON, SCIA, RIE-FLUORINE, WIRE-BONDER, RIGAKU3)
• Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER´S THESIS , p. 1 - 68
  (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SUSS-MA8, DEKTAK, MPS150, RIE-CHLORINE)
• Chmela, O; Sadilek, J; Sama, J; Romano-Rodriguez, A; Hubalek, J; Vallejos, S, 2017: Nanosensor array systems based on single functional wires selectively integrated and their sensing properties to C2H6O and NO2. NANOTECHNOLOGY VIII 10248, doi: 10.1117/12.2265000
  (RAITH, DWL, KAUFMAN, SCIA, RIE-FLUORINE, MAGNETRON, RIGAKU3)
• Pekárek, J.; Prokop, R.; Svatoš, V.; Gablech, I.; Hubálek, J.; Neužil, P., 2017: Self-compensating method for bolometer–based IR focal plane arrays. SENSORS AND ACTUATORS, A: PHYSICAL 265, p. 40 - 46, doi: 10.1016/j.sna.2017.08.025
  (SUSS-MA8, EVAPORATOR, RIE-FLUORINE, SUMMIT, SCIA)
• Fabianová, K., 2016: Fabrication of well defined nanoporous structures with application in membrane sensing. BACHELOR’S THESIS , p. 1 - 54
  (PECVD, MIRA, LYRA, RIE-FLUORINE, NANOCALC, MAGNETRON, EVAPORATOR)

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