Ultra High Vacuum Preparation and Analytical System - Molecular Beam Epitaxy SPECS (UHV-MBE)
CONTACT US
Guarantor:
Marek Otevřel, Ph.D.
Instrument status:
Operational, 15.2.2021 13:04
Equipment placement:
CEITEC Nano - C1.38
Research group:
CF: CEITEC Nano
Detailed description:
Ultra High Vacuum Preparation and Analytical System - Molecular Beam Epitaxy SPECS
Publications:
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NAZZARI, D., GENZER, J., RITTER, V., BETHGE, O., BERTAGNOLLI, E., RAMER, G., LENDL, B., WATANABE, K., TANIGUCHI, T., RURALI, R., KOLÍBAL, M., LUGSTEIN, A., 2021: Highly Biaxially Strained Silicene on Au(111). JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 125(18), p. 9973 - 8, doi: 10.1021/acs.jpcc.0c11033; FULL TEXT
(UHV-LEEM, UHV-MBE, UHV-DEPOSITION) -
Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
(UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM) -
Musálek, T., 2016: Semiconductor nanowire growth utilizing alloyed catalyst. MASTER’S THESIS , p. 1 - 52
(UHV-MBE, VERIOS, LYRA, MIRA, ALD)