Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS (UHV-PREPARATION)
CONTACT US
Guarantor:
Marek Otevřel, Ph.D.
Instrument status:
Operational, 7.1.2019 13:09, Burnt filament at the LEED system.
Equipment placement:
CEITEC Nano - C1.38
Research group:
CF: CEITEC Nano
Detailed description:
Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS
Publications:
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PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 ´-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
(UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM) -
Zadorozhnii, O., 2021: Exchange bias in metamagnetic heterostructures. MASTER´S THESIS , p. 1 - 81; FULL TEXT
(MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, LYRA, UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS) -
KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
(UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS) -
UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
(MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS) -
PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 ´-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
(UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)