Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties
APL MATERIALS
URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural
and magnetic properties. APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
(LYRA, HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, ICON-SPM, RIGAKU9, KERR-MICROSCOPE)
Equipment:
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
- Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660
- Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS
- Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS
- Scanning Probe Microscope Bruker Dimension Icon
- X-ray diffractometer with high brightness source Rigaku SmartLab 9kW
- Magneto-optical Kerr microscope
Research Groups:
- Nanomagnetism and spintronics - Vojtěch Uhlíř
- CF: CEITEC Nano
- Fabrication and Characterisation of Nanostructures - Tomáš Šikola
CEITEC authors: