Characterization of graphene elecrical properties on MEMS structures
Bachelor´s thesis
Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR´S THESIS , p. 1 - 50
(MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
Equipment:
- 4-probe station Cascade Microtech MPS 150
- Witec Alpha 300R
- Electron beam evaporator BESTEC
- Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
- RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100
- Resist stripper Diener electronic NANO Plasma cleaner
- Ion beam etching Scia Systems Coat 200
Research Groups:
CEITEC authors: