Parylene Micropillars Coated with Thermally Grown SiO2
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
(SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE, XEF2, APCVD, LYRA)
Equipment:
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- Resist coating and development system SÜSS MicroTec RCD8
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
- RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
- SCS Parylene Deposition System
- XeF2 Etching of Silicon
- Atmospheric Pressure Chemical Vapor Deposition
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
Research Groups:
CEITEC authors: