Effect of deposition angle on fabrication of plasmonic gold nanocones and nanodiscs
MICROELECTRONIC ENGINEERING
LIŠKA, J.; LIGMAJER, F.; PINHO NASCIMENTO, P.; KEJÍK, L.; KVAPIL, M.; DVOŘÁK, P.; HORKÝ, M.; LEITNER, N.; REIMHULT, E.; ŠIKOLA, T., 2020: Effect of deposition angle on fabrication of plasmonic gold nanocones and nanodiscs. MICROELECTRONIC ENGINEERING 228, p. 1 - 6, doi: 10.1016/j.mee.2020.111326; FULL TEXT
(EVAPORATOR, LYRA, RIE-FLUORINE, MIRA, ICON-SPM)
Equipment:
- Electron beam evaporator BESTEC
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
- RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
- Scanning Electron Microscope/E-beam writer TESCAN MIRA3Raith LIS
- Scanning Probe Microscope Bruker Dimension Icon
Research Groups:
- Nanomagnetism and spintronics - Vojtěch Uhlíř
- CF: CEITEC Nano
- Fabrication and Characterisation of Nanostructures - Tomáš Šikola
CEITEC authors: