Progress toward the development of single nanowire-based arrays for gas sensing applications
Ph.D Thesis
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
(ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
Equipment:
- Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
- UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
- Ion-Beam Sputter Deposition System BESTEC
- Resist stripper Diener electronic NANO Plasma cleaner
- Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
- Resist coating and development system SÜSS MicroTec RCD8
- E-beam writer RAITH150 Two
- Magnetron sputtering system BESTEC
- Electron beam evaporator BESTEC
- RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
- Ion beam etching Scia Systems Coat 200
- Mechanical profilometer Bruker Dektak XT
- Scanning Probe Microscope Bruker Dimension Icon
- Spectroscopic reflectometer Ocean Optics NanoCalc 2000
- 4-probe station Cascade Microtech MPS 150
- Wire bonder TPT HB 16
Research Groups:
CEITEC authors: